Company intelligence
Infinitesima
Enabling tomorrow’s semiconductors by delivering true 3D nanoscale information.
About Infinitesima
Infinitesima was spun out of the University of Bristol in 2001 and has been developing innovative metrology solutions which improve speed and precision in the manufacture of semiconductors. The company’s technology combines the 3-dimensional surface detection capability of atomic force microscopy (AFM), with high-speed laser activation and the accuracy of interferometry. The Rapid Probe Microscope (RPM™) is protected by an extensive patent portfolio. The company’s RPM™ technology is being used by leading semiconductor equipment companies globally. Semiconductor devices provide the foundations on which progress in the technology sector are enabled. From Smartphones to Artificial Intelligence, 5G communications to autonomous vehicles, all are made possible through advances in semiconductor processes. Scaling these processes requires sub-nanometer measurement of increasingly complex 3D structures to enable more powerful devices. Based in Abingdon, UK, we are a high calibre team of 80 people and continue to grow. We are backed by global financial and industry investors including Applied Ventures, the strategic venture arm of the industry leading equipment company.
Verified activity
Signals from Infinitesima
4 published signals
Presence & Recognition
Infinitesima participated in the SEMI Taiwan event with a high-energy presence and a focus on advanced packaging and quantum technology.
Reported by Infinitesima
Presence & Recognition
Infinitesima is attending the SPIE Photomask Technology + EUV Lithography conference in Monterey, California, from August 8 to 11, 2026.
Reported by Infinitesima
Presence & Recognition
Infinitesima CEO Peter Jenkins was featured in the latest edition of All Electronics Industry discussing closing the measurement gap in semiconductor manufacturing.
Reported by Infinitesima
Presence & Recognition
Infinitesima's AFM data is supporting ASML Fellow Jo Finders presenting new work on resist 3D effects in EUV lithography at SPIE
Reported by Infinitesima