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Presence & RecognitionEvent: September 8, 2026

imec demonstrated the feasibility of patterning tight-pitch random logic structures using a CAR-based single-print High NA EUV lithography step at the 2026 SPIE Photomask Technology + EUV Lithography Conference.

Published

Signal category

Presence & Recognition

Quote

At the 2026 SPIE Photomask Technology + EUV Lithography Conference, imec demonstrates the feasibility of patterning tight-pitch random logic structures using a CAR-based single-print High NA EUV lithography step.

imec team

Company

imec

Imec is a world-leading R&D and innovation hub in nanoelectronics and digital technologies.

Industry
Research Services
Location
Leuven, BE
Company size
4,946 employees

At imec, we shape the future by enabling nano- and digital technology innovation that enhances quality of life, together with partners from the industry, government, and academia. Since 1984, imec quickly made its name as the leading research hub for advanced CMOS scaling and continues to set the course for the semiconductor industry. Our expertise combines deep-tech with software and systems, unlocking smart, sustainable solutions in fields like healthcare, mobility, Industry 5.0, clean energy and agrifood. Ready to join us? Explore our R&D, start-up support, and career opportunities at imec-int.com.

Founded 1984

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imec demonstrated the feasibility of patterning tight-pitch random logic structures using a CAR-based single-print High NA EUV lithography step at the 2026 SPIE Photomask Technology + EUV Lithography Conference. | SeedOps