Kalpana Systems will be exhibiting at the EU PVSEC event in Rotterdam from September 14 to 18, 2026.

What if you could accelerate the energy transition thanks to a new perspective on atomic layer deposition for thin films? Imagine batteries with next-level performance, unrivalled range and fast charging. Imagine affordable flexible solar panels and OLED screens for unrestricted designs. Imagine fully recyclable packaging, thanks to ultra-thin barrier coatings. We found a way to solve the challenges of applying ALD technology to thin films. We like to call it: Superspatial ALD. Inspired by the helical design found in nature, our technology provides an elegant solution to break from industry standards. Superspatial ALD enables the deposition of complex multi-layers in just one production step. The unique helical web transport in our thin film machine enables the roll-to-roll production of coating layers at high throughput. Superspatial ALD speeds up the ALD process by 1000 times, reducing cost by a factor of 10, using precious materials with the precision of a single atom. All with one machine, adaptable to fit different substrate types and widths, with a small footprint that seamlessly integrates into your production line. The wait is over. Superspatial ALD is finally here.